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Tantalum Target

Tantalum Target
Tantalum Target
Product Code : 67
1 USD ($)
Price And Quantity
Minimum Order Quantity :
1
Unit of Measure :
Piece/Pieces
Price :
1 USD ($)
Product Specifications
Product Type :
Tantalum Target
Material :
tantalum
Product Description

Better known as tantalum planar sputtering target, the offered Tantalum Target ensures trouble free reproducible process performance and maintains uniformity regarding thickness. With application of this tantalum item, there is no need of utilizing texture banding for attaining even microstructure of sputter. Moreover, this tantalum item helps to extend functional life and improves performance of sputter. We provide this item with 3N to 5N purity level with even grain size. The metallic and gaseous impurities of offered item have been verified by using advanced technology. We are a well known manufacturer of standard grade Tantalum Target.

Features:

  • High biocompatibility
  • High strength under extreme temperature
  • Helps to enhance performance of sputter
Application
The offered tantalum item is utilized for producing thin film based items like gate electrode used in MOSFET device, diffusion barrier material, barrier metal for copper wiring system, memory device and as protective coating on print head system.

Chemical Composition :

Chemistry ppm

Description

Chief component

Impurities maximum

Ta

Nb

Fe

Si

Ni

W

Mo

Ti

O

C

H

N

Ta1

Remainder

300

40

30

20

40

40

20

150

40

15

20

Ta2

Remainder

800

100

100

50

200

200

50

200

100

15

100

TaNb3

Remainder

<35000

100

100

50

200

200

50

200

100

15

100

TaNb20

Remainder

170000- 230000

100

100

50

200

200

50

200

100

15

100

Ta2.5W

Remainder

400

50

30

20

30000

60

20

150

50

15

60

Ta10W

Remainder

400

50

30

20

110000

60

20

150

50

15

60


Better known as tantalum planar sputtering target, the offered Tantalum Target ensures trouble free reproducible process performance and maintains uniformity regarding thickness. With application of this tantalum item, there is no need of utilizing texture banding for attaining even microstructure of sputter. Moreover, this tantalum item helps to extend functional life and improves performance of sputter. We provide this item with 3N to 5N purity level with even grain size. The metallic and gaseous impurities of offered item have been verified by using advanced technology. We are a well known manufacturer of standard grade Tantalum Target.

Features:

  • High biocompatibility
  • High strength under extreme temperature
  • Helps to enhance performance of sputter
Application
The offered tantalum item is utilized for producing thin film based items like gate electrode used in MOSFET device, diffusion barrier material, barrier metal for copper wiring system, memory device and as protective coating on print head system.

Chemical Composition :

Chemistry ppm

Description

Chief component

Impurities maximum

Ta

Nb

Fe

Si

Ni

W

Mo

Ti

O

C

H

N

Ta1

Remainder

300

40

30

20

40

40

20

150

40

15

20

Ta2

Remainder

800

100

100

50

200

200

50

200

100

15

100

TaNb3

Remainder

<35000

100

100

50

200

200

50

200

100

15

100

TaNb20

Remainder

170000- 230000

100

100

50

200

200

50

200

100

15

100

Ta2.5W

Remainder

400

50

30

20

30000

60

20

150

50

15

60

Ta10W

Remainder

400

50

30

20

110000

60

20

150

50

15

60


Contact Us

2. Building 5, Liyu Industrial Park, No.581 Heilongjiang R.D Tianyuan District, Zhuzhou, Hunan, China
Phone :86-731-28410199